FAD Filtered Arc Deposition Device
Development of new functional films and development of next-generation surface protective films.
Achieve high-quality films that cannot be obtained with sputtering or plasma CVD! With the combination of SPS equipment (electric current sintering device), flexible thin film development becomes possible! From target production to film deposition experiments, all can be completed in one day! Real ion plating using clean vacuum arc plasma.
- Company：ウエキコーポレーション
- Price：Other
